Lung function and general illness symptoms in a semiconductor manufacturing facility.
Large quantities of potent gases, dopants, photoactive chemicals (photoresists, photoinitiators), solvents, and ionizing radiation are used in the semiconductor manufacturing process, but little is known about the occurrence of respiratory disease from exposures in this industry.
The purpose of this study was to assess the pulmonary risk by conducting pulmonary function tests and symptoms survey in a semiconductor plant in Taiwan.
This study is part of a clinical survey conducted on 926 workers in a semiconductor plant in Taiwan in July 1995.
The study items included a standard self-administered questionnaire, chest x-rays, pulmonary function tests, and physical examinations in 249 workers.
There was a borderline significance of higher prevalence (P=0.06) of restrictive lung abnormality in male photolithographic workers (4 of 21 ; 19.1%) than in male control workers (0 of 17 ; 0%), and the smoking-and age-adjusted odds ratio was 4.1 (95% confidence interval [CI], 0.41-41.6).
There was a significantly higher prevalence (P=0.02) of restrictive lung abnormality in male ion-implantation workers (5 of 19 ; 26.3%) than in male control workers (0 of 17 ; 0%), and the smoking-and age-adjusted odds ratio was 3. 7 (95% CI, 0.52-26.7).
There were significantly higher prevalences of airway irritation, eye irritation, headache, stress, tiredness, and poor memory in female photolithographic or etch/diffusion workers than in control workers. (...)
Mots-clés Pascal : Maladie professionnelle, Médecine travail, Facteur risque, Poumon pathologie, Semiconducteur, Industrie électronique, Homme, Comparaison interindividuelle, Sexe, Symptomatologie, Incidence, Enquête, Poste travail, Analyse multivariable, Appareil respiratoire pathologie
Mots-clés Pascal anglais : Occupational disease, Occupational medicine, Risk factor, Lung disease, Semiconductor materials, Electronics industry, Human, Interindividual comparison, Sex, Symptomatology, Incidence, Survey, Workplace layout, Multivariate analysis, Respiratory disease
Notice produite par :
Inist-CNRS - Institut de l'Information Scientifique et Technique
Cote : 99-0001596
Code Inist : 002B11D. Création : 31/05/1999.